JPH0362010B2 - - Google Patents

Info

Publication number
JPH0362010B2
JPH0362010B2 JP3533284A JP3533284A JPH0362010B2 JP H0362010 B2 JPH0362010 B2 JP H0362010B2 JP 3533284 A JP3533284 A JP 3533284A JP 3533284 A JP3533284 A JP 3533284A JP H0362010 B2 JPH0362010 B2 JP H0362010B2
Authority
JP
Japan
Prior art keywords
substrate
pattern
area
alignment marks
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3533284A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60180120A (ja
Inventor
Hideki Ine
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59035332A priority Critical patent/JPS60180120A/ja
Publication of JPS60180120A publication Critical patent/JPS60180120A/ja
Priority to US07/186,773 priority patent/US4883359A/en
Publication of JPH0362010B2 publication Critical patent/JPH0362010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59035332A 1984-02-28 1984-02-28 アライメント方法 Granted JPS60180120A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59035332A JPS60180120A (ja) 1984-02-28 1984-02-28 アライメント方法
US07/186,773 US4883359A (en) 1984-02-28 1988-04-25 Alignment method and pattern forming method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59035332A JPS60180120A (ja) 1984-02-28 1984-02-28 アライメント方法

Publications (2)

Publication Number Publication Date
JPS60180120A JPS60180120A (ja) 1985-09-13
JPH0362010B2 true JPH0362010B2 (en]) 1991-09-24

Family

ID=12438874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59035332A Granted JPS60180120A (ja) 1984-02-28 1984-02-28 アライメント方法

Country Status (1)

Country Link
JP (1) JPS60180120A (en])

Also Published As

Publication number Publication date
JPS60180120A (ja) 1985-09-13

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term